Magnetic pole fabrication process and device
US6547975B1 · kind B1 · utility
18Cited by
29References
14Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 26, 2000 |
| Grant date | Apr 15, 2003 |
| Priority date | — |
| Expiry date | Jun 27, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B5/313
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A method and apparatus for fabricating a submicrometer structure. The method incorporates a sputtering process to deposit an electromagnetic material from a seedlayer onto a vertical sidewall. The vertical sidewall is subsequently removed, leaving a free-standing pole-tip. The resulting structure formed can have a a width of less than 0.3 micrometers, if desired. This structure can be used as a magnetic pole of a thin film head (“TFH”) for a data storage device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.