Vacuum/gas phase reactor for dehydroxylation and alkylation of porous silica
US6548113B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 9, 2000 |
| Grant date | Apr 15, 2003 |
| Priority date | — |
| Expiry date | Nov 9, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/249972
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Vacuum/gas phase reactor embodiments used in gas phase dehydroxylation and alkylation reactions are described in which the substrate could be subjected to high vacuum, heated to target temperature, and treated with silane as quickly and efficiently as possible. To better facilitate the silylation and to increase the efficiency of the process, the reactor is designed to contain quasi-catalytic surfaces which can act both as an “activator” to put species in a higher energy state or a highly activated state, and as a “scrubber” to eliminate possible poisons or reactive by-products generated in the silylation reactions. One described embodiment is a hot filament reactor having hot, preferably metallic, solid surfaces within the reactor's chamber in which wafers having mesoporous silicate films are treated. Another is an IR reactor having upper and lower quartz windows sealing the upper and lower periphery of an aluminum annulus to form a heated chamber. Finally, a flange reactor is described that includes a flange base and lid forming a tiny chamber therein for a wafer, the reactor being heated by conduction from a hot sand bath. The dehydroxylation and alkylati…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.