Means and method for controlling the intensity distribution of a laser beam

US6548781B1 · kind B1 · utility

Assignee

• Microlas Lasersystem GmbH · DE

Inventor

• Klaus Brunwinkel · Göttingen, DE

Key dates

• Filing date: Mar 30, 2000
• Grant date: Apr 15, 2003
• Expiry date: Mar 30, 2020

Classification

• Technology area (CPC G): Physics
• CPC primary: G02B27/0905
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

An apparatus and a method for controlling the intensity distribution of a laser beam for processing a substrate provide that the laser radiation passes a homogenizing device, subsequent to which partial beams of the laser beam superimpose one another so that a homogenization of the intensity distribution of the laser beam is achieved. By arrangement of a diaphragm at a position in the radiation path of the laser beam, radiation is cut out off the partial beams superimposing one another in such a way that varied portions of at least some of the partial beams are cut out.