Quartz glass body for optical component and process for manufacture thereof

US6550277B1 · kind B1 · utility

Assignee

• HERAEUS QUARZGLAS GMBH & CO. KG · DE

Inventors

• Bruno Uebbing · Alzenau, DE
• Jan Vydra · Hanau, DE

Key dates

• Filing date: Nov 10, 2000
• Grant date: Apr 22, 2003
• Expiry date: Aug 16, 2021

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S501/905
• WIPO field: Materials, metallurgy
• WIPO sector: Chemistry

Abstract

The invention concerns a quartz glass body for an optical component for the transmission of UV radiation with a wavelength of 250 nm and less, especially for a wavelength of 157 nm, as well as a process for the manufacture of the quartz glass body where fine quartz glass particles are formed by flame hydrolysis of a silicon compound, deposited and vitrified. Suitability of a quartz glass as represented by high base transmission and radiation resistance depends on structural properties caused by local stoichiometric deviations, and on the chemical composition. The quartz glass body according to the inventions is distinguished by a uniform base transmission (relative change of base transmission ≦1%) in the wavelength range from 155 nm to 250 nm (radiation penetration depth of 10 mm) of at least 80%, a low OH content (less than 10 ppm by weight) and a glass structure substantially free from oxygen defect centers. A quartz glass body of this kind is manufactured by a process which allows bulk embedding of hydrogen or oxygen into the glass network in that at least a two stage heat treatment takes place at temperatures ranging from 850° C. to 1600° C. before the vitrification,…