Method for manufacturing a photocathode
US6551162B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 2, 2002 |
| Grant date | Apr 22, 2003 |
| Priority date | — |
| Expiry date | Jul 2, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J9/12
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method for manufacturing a photocathode includes positioning the photocathode on a support such that an etch surface of the photocathode faces away from the support. The method includes inserting an end of the support containing the photocathode into a cap. The cap comprises a passage operable to direct an etch compound to the etch surface of the photocathode. The method also includes aligning the etch surface of the photocathode with the passage of the cap using the support. The method also includes inserting a plunger through a passage in the support to contact a surface of the photocathode opposite the etch surface of the photocathode. The method further includes securing the photocathode against the cap using the plunger to confine the etch compound to the etch surface of the photocathode.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.