Stable metal-safe stripper for removing cured negative-tone novolak and acrylic photoresists and post-etch residue
US6551973B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Oct 9, 2001 |
| Grant date | Apr 22, 2003 |
| Priority date | — |
| Expiry date | Oct 17, 2021 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D7/34
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A stripping composition is provided for removing polymeric organic substances from an inorganic substrate. The stripping composition comprises about 3 to about 15 weight percent aromatic quaternary ammonium hydroxide, preferably benzyltrimethylammonium hydroxide (BTMAH), about 50 to about 87.5 weight percent alkylsulfoxide, a co-solvent preferably a glycol, and, desirably, a suitable corrosion inhibitor and a non-ionic surfactant. Also provided is a method for stripping polymeric organic substances (i.e., negative-tone novolak and acrylic photoresists and post-etch residue) from inorganic substrates by contacting the polymeric organic substance with the organic stripping the BTMAH composition for a period of time sufficient to remove said polymeric substances.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.