Polish compositions for gloss enhancement, and method
US6551974B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 23, 2000 |
| Grant date | Apr 22, 2003 |
| Priority date | — |
| Expiry date | Jun 27, 2020 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC11D2111/14
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A composition and method for use in imparting or maintaining a glossy or shiny finish on a hard surface. In one embodiment, the composition comprises a base polish component or components, and at least one poly[oxyalkylene] ammonium cationic surfactant. In another embodiment, a method of imparting a glossy finish on a hard surface by applying a composition to the hard surface, the composition comprising at least one poly[oxyalkylene] ammonium cationic surfactant In some such embodiments, the composition comprises a base polish and the poly[oxyalkylene] ammonium cationic surfactant is dispersed in the base polish. Preferably, the poly[oxyalkylene] ammonium cationic surfactant comprises in the range of about 0.01 to about 10 wt. %, more preferably in the range of about 0.05 to about 5 wt. %, and more preferably in the range of about 0.1 to about 1 wt. % of the total composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.