Patent · US Expired

Preparation of metal imino/amino complexes for metal oxide and metal nitride thin films

US6552209B1 · kind B1 · utility

502Cited by
5References
21Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 24, 2002
Grant dateApr 22, 2003
Priority date
Expiry dateJun 24, 2022

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC07F9/005
  • WIPO fieldOrganic fine chemistry
  • WIPO sectorChemistry

Abstract

This invention relates to an improved process to produce metal imino/amino complexes having the formula R1N=M(NR2R3)3 where M is a pentavalent metal or (R1N=)2M′(NR2R3)2 where M′ is a hexavalent metal. In the process MX5 and two-equivalents of primary amine R1NH2 or metal hexahalide, M′X6 with seven-equivalents of primary amine H2NR1 are reacted in the presence of excess pyridine. The resulting reaction product R1N═MX3(py)2 or [(R1N)2M′X2(py)]2 then is followed by the addition of LiNR2R3. The process provides the final product in high yield and in high purity as well as representing a simplified procedure for synthesizing R1N═M(NR2 R3)3 or (R1N═)2M′(NR2R3)2type complexes.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.