Optical measuring system
US6552810B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 2, 2000 |
| Grant date | Apr 22, 2003 |
| Priority date | — |
| Expiry date | Feb 2, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01D5/36
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An optical position measuring system for determining the relative position of a first object which can be moved with respect to a second object along a measuring direction includes at least one periodic measuring graduation, which is connected to the first object and a scanning unit which is connected with the second object. The scanning unit includes a light source emitting beams of light, at least one scanning graduation and a detector arrangement in a detector plane. The detector arrangement includes several radiation sensitive detector elements for scanning a periodic fringe pattern resulting from the interaction of the beams of light emitted by the light source with the at least one periodic measuring graduation and the at least one scanning graduation, wherein the detector plane is arranged spaced at a distance Zn from the last graduation passed and the distance Zn is calculated from the following equation:1/Zn+1/ZQ=1/((n+&eegr;)*dVTO),wherein:ZQ: is the distance of the last graduation passed from a real and virtual source point of the periodic fringe pattern,n=0, 1, 2, 3, . . . ,&eegr;: is the phase shift in fractions of 360° of the periodic fringe pattern exiting at the…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.