Method of manufacturing information recording medium
US6554974B2 · kind B2 · utility
7Cited by
4References
6Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Dec 6, 2000 |
| Grant date | Apr 29, 2003 |
| Priority date | — |
| Expiry date | Dec 6, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B2007/25713
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A recording film is formed on a surface of a substrate, including the slopes, which are positioned on both sides of each information track and have surfaces not parallel to the surfaces of the information tracks. The surface of the substrate is sputter-etched by accelerated ions impinging against the substrate surface in a substantially vertical direction. The recording film on each slope is etched away based on the dependence of a sputtering rate upon an incident angle of the ions, while the recording film remains on the surface of each information track.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.