In situ vacuum method for making OLED devices
US6555284B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 27, 2001 |
| Grant date | Apr 29, 2003 |
| Priority date | — |
| Expiry date | Dec 27, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K85/631
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An in-situ vacuum method for fabricating, at least in part, an OLED device that is moisture- or oxygen-sensitive, such method including providing into a vacuum coater a receiver element which will form part of the OLED device; providing into said vacuum coater a donor support element and coating such donor support element to produce a donor element with one or more layers required to produce all or part of the OLED device; positioning the coated side of the donor element in material transferring relinquish to the receiver element to be coated; and applying radiation to the d nor element to selectively transfer in vacuum one or more layers from the donor element to the receiver element.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.