Fabrication of photonic band gap materials using microtransfer molded templates
US6555406B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 22, 2002 |
| Grant date | Apr 29, 2003 |
| Priority date | — |
| Expiry date | Feb 22, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/1225
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of manufacturing photonic band gap structures operable in the optical spectrum has been presented. The method comprises the steps of creating a patterned template for an elastomeric mold, fabricating an elastomeric mold from poly-dimethylsiloxane (PDMS) or other suitable polymer, filling the elastomeric mold with a second polymer such as epoxy or other suitable polymer, stamping the second polymer by making contact with a substrate or multilayer structure, removing the elastomeric mold, infiltrating the multilayer structure with ceramic or metal, and heating the multilayer structure to remove the second polymer to form a photonic band gap structure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.