Period reconfiguration and closed loop calibration of an interference lithography patterning system and method of operation
US6556280B1 · kind B1 · utility
41Cited by
18References
41Claims
0Family size
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Key dates
| Filing date | Sep 19, 2000 |
| Grant date | Apr 29, 2003 |
| Priority date | — |
| Expiry date | Nov 18, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70408
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic tool system for generating an interferometric pattern of light using a plurality of exposure beams includes a processor coupled to a positioning device. The processor receives a selected period for the interferometric pattern of light, and generates an angular control signal and a translational control signal in response to the selected period. The positioning device translates an exposure beam in response to the translational control signal, and rotates the exposure beam in response to the angular control signal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.