Silicon sliders with trapezoidal shape and drie process for fabrication
US6556380B2 · kind B2 · utility
22Cited by
13References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 10, 2001 |
| Grant date | Apr 29, 2003 |
| Priority date | — |
| Expiry date | Aug 28, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B5/6005
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A trapezoidal shaped silicon slider is described in the present invention. The slider has a first parallel surface larger than a second parallel surface, thereby generating a built-in positive pitch with respect to a recording medium when the slider is incorporated into a hard disk drive. The slider further includes round edges at the first parallel surface, longitudinal holes within its body, non-planar slanted side surfaces, and a rounded leading edge. The silicon, trapezoidal slider is fabricated using a deep reactive ion etching (DRIE) technique.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.