Electrostatic and vacuum chucking holding apparatus
US6556414B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | May 31, 2001 |
| Grant date | Apr 29, 2003 |
| Priority date | — |
| Expiry date | Jun 21, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6875
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
This invention provides an attraction holding apparatus for holding a plate-shaped specimen to improve the uniformity of surface temperatures in microscopic regions of the specimen while exhibiting sufficient holding strength and detachability after the impressed voltage is removed (in the case of electrostatic chucking), without causing degradation in the chemical and mechanical properties at the surfaces contacting the specimen, such as the upper surfaces of the protrusions, and without having to introduce excessive amount of gas. This attraction holding apparatus is constituted by a flat base and a plurality of protrusions erected in the attachment region in the flat base, so that the plate-shaped specimen is held on the protrusions. Each upper surf ace of the protrusions is constituted by a specimen holding surface and a concavity. According to this invention, uniformity of surface temperatures in the microscopic regions of the specimen is improved, without causing degradation in the chemical and mechanical properties of the protrusion formed inside the attachment region and without introducing excessive amount of gas.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.