Patent · US Expired

Relation to the manufacture of masks and electronic parts

US6558872B1 · kind B1 · utility

2Cited by

5References

12Claims

0Family size

Assignee

Kodak Polychrome Graphics Company Ltd. · US

Inventors

Kevin Ray · Windham, US
Anthony P. Kitson · Greeley, US
Eduard Kottmair · Ebenhausen, DE
Hans-Horst Glatt · Munich, DE
Stefan Hilgart · Munich, DE

Key dates

Filing date	Sep 9, 2000
Grant date	May 6, 2003
Priority date	—
Expiry date	Dec 26, 2020

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S430/145
WIPO fieldAudio-visual technology
WIPO sectorElectrical engineering

Abstract

Imagable precursors for masks and for electronic parts comprise a polymeric layer applied to a substrate. The layer comprises at least one polymer having infra-red absorbing groups carried as pendent groups on the polymer backbone. Certain infra-red absorbing groups may also act to insolubilize the polymer in a developer, until it is imagewise exposed to infra-red radiation. Imagewise application of heat, resulting from imagewise exposure of the precursor to infra-red radiation, renders the polymer layer more soluble in the developer than prior to exposure to the infra-red radiation.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.