Photoresist stripper/cleaner compositions containing aromatic acid inhibitors
US6558879B1 · kind B1 · utility
4Cited by
5References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 25, 2000 |
| Grant date | May 6, 2003 |
| Priority date | — |
| Expiry date | Sep 25, 2020 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/31133
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A stripping and cleaning composition for the removal of residue from metal and dielectric surfaces in the manufacture of semi-conductors and microcircuits. The composition is an aqueous system including organic polar solvents including corrosive inhibitor component from a select group of aromatic carboxylic acids used in effective inhibiting amounts. A method in accordance with this invention for the removal of residues from metal and dielectric surfaces comprises the steps of contacting the metal or dielectric surface with the above inhibited compositions for a time sufficient to remove the residues.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.