Apparatus and method for laser etching wear patterns into denim pants
US6559410B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 29, 2001 |
| Grant date | May 6, 2003 |
| Priority date | — |
| Expiry date | Oct 16, 2021 |
Classification
- Technology area (CPC D)Textiles; Paper
- CPC primaryD06C23/02
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
An apparatus and method for forming simulated wear patterns and designs in denim pants using laser rays. The apparatus includes an indexable carousel having a plurality of circumferentially spaced pant-supporting mandrels that are sequentially indexable to a plurality of stations located about the carousel, including a loading station, a laser station, and an unloading station. The mandrels each comprise articulated linkage that is selectively actuatable between a retractable condition that permits positioning of a pair of pants onto the mandrel at the loading station and an expanded condition that tautly supports the pants in predetermined position at the laser station such that a laser generated pattern can be formed at predetermined locations on the pants.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.