Ultraviolet lamp system and methods
US6559460B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 31, 2000 |
| Grant date | May 6, 2003 |
| Priority date | — |
| Expiry date | Jun 7, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J65/044
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
An ultraviolet radiation generating system and methods is disclosed for treating a coating on a substrate, such as a coating on a fiber optic cable. The system comprises a microwave chamber having one or more ports capable of permitting the substrate to travel within or through a processing space of the microwave chamber. A microwave generator is coupled to the microwave chamber for exciting a longitudinally-extending plasma lamp mounted within the processing space of the microwave chamber. The plasma lamp emits ultraviolet radiation for irradiating the substrate in the processing space. A reflector is mounted within the processing space of the microwave chamber and is capable of reflecting ultraviolet radiation to uniformly irradiate the substrate in a surrounding fashion. When the system is operating, the microwave chamber is substantially closed to emission of microwave energy and ultraviolet radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.