Coating apparatus and method
US6562136B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 8, 2000 |
| Grant date | May 13, 2003 |
| Priority date | — |
| Expiry date | Jan 12, 2021 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB05B15/70
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The invention provides a device for holding a substrate during deposition processes that includes a rotation member rotatable about a first, central axis, and a plurality of substrate holders positioned on the rotation member, the substrate holders being rotatable about second axes. In another aspect, the invention provides a method of applying a substantially uniform coating on a substrate including the steps of providing a device of the invention; mounting a substrate onto the substrate mounts; providing at least one substrate coating station in spaced relation to the substrate mounts; rotating the rotation member about a central axis to position one or more of the substrate mounts at the substrate coating station; supplying the coating through the nozzle; moving the nozzle of the coating station in a direction parallel to the substrate at a predetermined rate to apply a uniform coating on the substrate; and rotating the substrate mounts about the second axes during the coating process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.