Method of producing an optical element having a multiple-level step-like structure through lithography
US6562253B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Jul 28, 2000 |
| Grant date | May 13, 2003 |
| Priority date | — |
| Expiry date | Jul 28, 2020 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/1857
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A method of producing an optical element having a multiple-level step-like structure includes a first process for providing a first mask pattern at a position corresponding to a predetermined boundary among boundaries at steps of the multiple-level step-like structure of a substrate, the first mask pattern having a width narrower than that of a single step, a second process for providing a second mask pattern upon the substrate having the first mask pattern formed thereon, the second mask pattern having a width corresponding to a single step or plural steps of the multiple-level step-like structure and a third process for processing the substrate by use of the first and second mask patterns and thereafter for removing the second mask pattern while leaving the first mask pattern there. After repeating the second and third processes plural times of a predetermined number, the first mask pattern is removed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.