Methods of producing substantially anatase-free titanium dioxide with silicon halide addition
US6562314B2 · kind B2 · utility
12Cited by
4References
31Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 20, 2001 |
| Grant date | May 13, 2003 |
| Priority date | — |
| Expiry date | Feb 20, 2021 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01P2004/62
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The present invention provides methods of producing substantially anatase-free titanium dioxide by mixing titanium tetrachloride with a silicon compound to form an admixture, and introducing the admixture and oxygen into a reaction zone to produce the substantially anatase-free titanium dioxide. The reaction zone has a pressure of greater than 55 psig.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.