Lithographic printing method using a low surface energy layer
US6562553B2 · kind B2 · utility
3Cited by
14References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 10, 2001 |
| Grant date | May 13, 2003 |
| Priority date | — |
| Expiry date | Jun 12, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2014
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of contact printing on a device using a partially transparent mask (18) having first and second surfaces, comprises the steps of applying a layer of low surface energy polymeric material (22) to the first surface of the mask; placing the first surface (24) of the mask contiguous to the device (10), the layer of low surface energy polymeric material being substantially in contact with the device; and applying radiation (32) to the second surface of the mask for affecting a pattern in the device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.