Method of fabricating fringe field switching mode liquid crystal display
US6562645B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 28, 2001 |
| Grant date | May 13, 2003 |
| Priority date | — |
| Expiry date | Jun 28, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/134372
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is a method of fabricating fringe field switching mode liquid crystal display by forming a gate bus line and a common electrode line on a lower substrate in parallel with each other; forming a gate insulating layer on the lower substrate; forming a counter electrode on the gate insulating layer to overlap with a predetermined part of the common electrode line; depositing a metal layer on the resulting lower substrate and then selectively patterning the metal layer, thereby forming a contacting part connecting the counter electrode to the exposed common electrode line; depositing a protective layer on the lower substrate obtained after formation of the source, the drain and the contacting part; selectively etching the protective layer to expose a predetermined part of the drain; and forming a pixel electrode on the protective layer to form a field with the counter electrode, being in contact with the drain.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.