Formation of a surface on an optical component
US6563997B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 28, 2000 |
| Grant date | May 13, 2003 |
| Priority date | — |
| Expiry date | Apr 18, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B2006/12176
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of forming a reflecting surface on an optical component is disclosed. The method includes forming a first mask so as to protect a ridge region of a light transmitting medium. The ridge region is a region where a ridge of a waveguide will be formed. The method also includes performing a first etch of the light transmitting medium so as to form a side of the ridge. The first mask defines a profile of the side of the ridge during the first etch. The method further includes performing a second etch of the light transmitting medium so as to form the reflecting surface. The first mask defines a profile of the reflecting surface during the second etch.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.