Process for removing the fluorocompounds or fluorosulphur compounds from a stream of xenon and/or krypton by permeation
US6565821B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Sep 5, 2000 |
| Grant date | May 20, 2003 |
| Priority date | — |
| Expiry date | Jan 24, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P20/151
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A process and a plant for removing the gaseous fluorocompounds or fluorosulphur compounds, such as CF4, C2F6, and SF6, present in a stream of xenon and/or krypton, by permeation via one or more membranes, such as polymer membranes. The xenon and/or krypton thus produced may then be further purified or separated by cryogenic distillation. Prior to the permeation step, the other impurities, particularly the hydrocarbons, may be removed by oxidative catalysis and subsequent adsorption of the carbon dioxides and of the water produced. The xenon, the krypton and the xenon/krypton mixtures free of gaseous fluorocompounds or fluorosulphur compounds and purified by such process can be used as plasma propulsion gas, especially for satellites, or as inter-pane insulation gas for a sealed unit, particularly for double-glazing windows.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.