Patent · US Expired

Method and apparatus for inspecting substrates

US6566674B1 · kind B1 · utility

77Cited by
32References
30Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 21, 1999
Grant dateMay 20, 2003
Priority date
Expiry dateJun 21, 2019

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N21/88
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

Apparatus for detecting defects in a substrate comprises a laser for providing a laser beam, and a bi-cell photodiode comprising two cells. Circuitry coupled to the bi-cell photodiode provides a signal equal to (L−R)/(L+R), where L and R equal the signal strengths of the signals provided by the left and right photodiode cells, respectively. The photodiode is biased so that it exhibits reduced capacitance, and can provide increased output signal bandwidth.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.