Exposure device

US6567205B1 · kind B1 · utility

Assignees

• Basys Print GmbH Systeme fuer die Drueckindustrie · DE
• Tokyo Ink Mfg. Co., Ltd. · JP

Inventors

• Stefan Eggers · Wentdorf, DE
• Hans-Dieter Straeter · Reppenstedt, DE

Key dates

• Filing date: Jun 29, 2001
• Grant date: May 20, 2003
• Expiry date: Jun 29, 2021

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70291
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

An exposure device with a lamp, a condenser arrangement (2), a light modulator, a field lens and a projection objective (5), characterised in that the light modulator consists of a reflecting micro-mirror arrangement (3) in front of which the field lens (4) is arranged in a manner such that the beam path runs through the field lens (4) onto the micro-mirror arrangement (3) and after modulation and reflection at acute angles (16) once again runs through the field lens (4).