Star pinch X-ray and extreme ultraviolet photon source
US6567499B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 7, 2001 |
| Grant date | May 20, 2003 |
| Priority date | — |
| Expiry date | Oct 28, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70033
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A source of photons includes a discharge chamber, first and second groups of ion beam sources in the discharge chamber and a neutralizing mechanism. Each of the ion beam sources electrostatically accelerates a beam of ions of a working gas toward a plasma discharge region. The first group of ion beam sources acts as a cathode and the second group of ion beam sources acts as an anode for delivering a heating current to the plasma discharge region. The neutralizing mechanism at least partially neutralizes the ion beams before they enter the plasma discharge region. The neutralized beams and the heating current form a hot plasma that radiates photons. The photons may be in the soft x-ray or extreme ultraviolet wavelength range and, in one embodiment, have wavelengths in a range of about 10-15 nanometers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.