Process for developing exposed radiation-sensitive printing plate precursors
US6569609B2 · kind B2 · utility
4Cited by
9References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 14, 2002 |
| Grant date | May 27, 2003 |
| Priority date | — |
| Expiry date | Feb 14, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/3071
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A replenisher composition developing exposed radiation-sensitive printing plate precursors for plate/developer systems in which the electrical conductivity of the developer does not decrease to the same extend as the activity of the developer decreases or even increases is disclosed. A method for developing exposed radiation-sensitive printing plates using the replenisher composition is also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.