Pattern exposure method, exposure device, formation of nucleic acid array, and formation of peptide array
US6569671B1 · kind B1 · utility
25Cited by
7References
3Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 19, 2001 |
| Grant date | May 27, 2003 |
| Priority date | — |
| Expiry date | Jan 19, 2021 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC40B40/08
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
This invention provides a pattern exposure method which may be used for effectively preparing, for example, a DNA or peptide array with a lower cost and a device therefor. Specifically, the method is a method for pattern exposure comprising the step of exposing a photosensitive material on a solid-phase substrate by irradiating it with a light as a pattern, wherein the photosensitive material is selectively exposed with beams selectively emitted from multiple vertical cavity surface emitting laser sources aligned as an array.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.