Device for shaping an electron beam, method for producing said device and use thereof

US6570320B1 · kind B1 · utility

Assignee

• Siemens Aktiengesellschaft · DE

Inventors

• Klaus Burkhardt · Gondelsheim, DE
• Wolfgang Eckhardt · Lörrach, DE
• Silvia Gohlke · Hersbruck, DE
• Ruth Männer · Höhenkirchen-Siegertsbrunn, DE
• Wolfram Wersing · Tauberbischofsheim, DE

Key dates

• Filing date: Dec 4, 2000
• Grant date: May 27, 2003
• Expiry date: Dec 4, 2020

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J2237/1205
• WIPO field: Electrical machinery, apparatus, energy
• WIPO sector: Electrical engineering

Abstract

The invention is directed to an extremely low-capacitance device for shaping an electron beam. The device is based on a ceramic body having a monolithic multi-layer structure. The manufacture of the ceramic body ensues with the assistance of LTCC technology, whereby this method is designationally modified. The body is constructed of pre-sintered ceramic layers whose lateral shrinkage is suppressed. The through apertures of the electrodes for the electron beam are thus arranged exactly coaxially, and the tolerances of the electrode dimensions are decoupled from the shrinkage during sintering. The electron beam of an electron gun is focused and the intensity thereof is modulated with the assistance of such a device.