Multi-beam exposure method
US6570603B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 20, 2001 |
| Grant date | May 27, 2003 |
| Priority date | — |
| Expiry date | Aug 20, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH04N1/06
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
In a method for multi-beam exposure of a printing form, preferably with laser beams, a computer transmits printing form data to a distributor via a data line as a sequence of recording lines and the distributor cyclically distributes the recording lines onto the input stages of an optics head where N parallel laser beams are generated and modulated with the printing form data of the recording lines. The laser beams are subdivided into active and inactive laser beams, recording lines of the printing form are transmitted via the data line for the active laser beams, and empty lines are inserted into the transmitted sequence of the recording lines for the inactive laser beams. The empty lines contain data values with which the inactive laser beams are driven dark.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.