Optical system for oblique incidence interferometer and apparatus using the same
US6570661B2 · kind B2 · utility
1Cited by
4References
7Claims
0Family size
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Key dates
| Filing date | Dec 18, 2000 |
| Grant date | May 27, 2003 |
| Priority date | — |
| Expiry date | Aug 30, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B9/02059
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
In an interferometer optical system comprising a reference standard having an entrance surface on which a luminous flux from a light source is incident and a reference plane on which the luminous flux entering from the entrance surface is obliquely incident, an angle within the range of 10° to 30° is formed between the entrance surface and reference plane of the reference standard.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.