Substrate provided with antireflection films and its production method
US6570709B2 · kind B2 · utility
53Cited by
12References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 26, 2001 |
| Grant date | May 27, 2003 |
| Priority date | — |
| Expiry date | Jul 26, 2021 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2217/734
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
The present invention provides a substrate with antireflection films, which has excellent antireflection properties to incident light at an oblique angle from the film face side and high transmittance. Moreover, the antireflection films of the present invention provide a reflection color tone that does not tend to be bluish. This object is achieved where the substrate with antireflection films comprises a transparent substrate and at least two antireflection film layers deposited on one side of the transparent substrate as described herein.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.