Deposition of &ggr;-Al2O3 by means of CVD
US6572991B1 · kind B1 · utility
16Cited by
8References
26Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 4, 2000 |
| Grant date | Jun 3, 2003 |
| Priority date | — |
| Expiry date | Feb 4, 2020 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T407/27
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
There is disclosed a coated body having as the outer layer a layer of &ggr;-Al2O3 deposited by chemical vapor deposition, preferably at a temperature of from 700-900° C. The &ggr;-Al2O3 layer is formed through the use of a gaseous mixture including H2S in amounts significantly higher than those presently used and at a temperature of from 700-900° C. The method is also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.