Method and apparatus for cleaning electronic test contacts
US6573702B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 12, 1997 |
| Grant date | Jun 3, 2003 |
| Priority date | — |
| Expiry date | Sep 12, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01R3/00
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A method and device for cleaning an electrical contact. Semiconductor testing device. Process of manufacturing integrated circuits. The electrical contact is used for contacting an integrated circuit and accumulates debris during use. The method comprises directing electromagnetic radiation at the contact. The electromagnetic energy reacts with at least one of the contact and the debris so as to cause at least a portion of the debris on the contact to be removed. The electromagnetic radiation may comprise coherent radiation, such as electromagnetic radiation generated using a laser. The portion of the debris may comprise organic debris, aluminum oxide, polyimide, or other debris. According to one aspect of the invention, the contact comprises a conductive material and the electromagnetic radiation causes removal of the portion of the debris substantially without removal of the conductive material. According to another aspect of the invention, the electromagnetic radiation at least partially melts the conductive material. In one preferred system, the contact comprises a probe tip. In such a system the probe tip may comprise the tip of a probe needle mounted to a probe card used for …
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.