Primary ion or electron current adjustment to enhance voltage contrast effect
US6573736B1 · kind B1 · utility
3Cited by
6References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 9, 2002 |
| Grant date | Jun 3, 2003 |
| Priority date | — |
| Expiry date | Jan 9, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/31749
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A new method is provided for identifying Voltage Contrast that is applied for the evaluation of characteristics of deposition of thin layers of semiconductor material. The voltage contrast is enhanced by applying increased electron beam current, provided by either E-beam or ion-beam current, to the point under investigation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.