Method and apparatus for measuring optical aberrations of an eye
US6575572B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 21, 2001 |
| Grant date | Jun 10, 2003 |
| Priority date | — |
| Expiry date | Dec 22, 2021 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61B3/156
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
Embodiments of the present invention provide a method and apparatus for measurement of aberration of an eye. One or more embodiments provide an aberration measurement instrument that enables measurement wherein Hartmann-Shack spots have reduced speckle; one or more embodiments provide an aberration measurement instrument that enables measurement of an eye having a large diopter power variation over different zones of the eye; one or more embodiments provide an aberration measurement instrument that enables measurement with accommodation control; one or more embodiment provide an aberration measurement instrument wherein radiation reflected by a cornea and radiation scattered by intra-ocular elements are blocked; and one or more embodiment provide an aberration measurement instrument wherein a hazy background produced by radiation multiply scattered within an eye is reduced.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.