Arrangement and method for measuring surface irregularities
US6577404B2 · kind B2 · utility
2Cited by
5References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 9, 2001 |
| Grant date | Jun 10, 2003 |
| Priority date | — |
| Expiry date | Oct 28, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B11/30
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An arrangement and method for measuring surface irregularities of an object comprising at least one source of light arranged to illuminate the object from at least two different positions at a small angle of incidence towards the object, a camera arranged to measure the shadow formation generated by the illumination of the surface microstructure, and an evaluator for determining the surface microstructure from the generated shadow formation by means of signal processing of an input signal from the camera.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.