Sample analyzing monitor and combustion control system using the same
US6580067B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 15, 2000 |
| Grant date | Jun 17, 2003 |
| Priority date | — |
| Expiry date | Jan 25, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N33/0049
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The present invention is to provide a monitoring device making it possible to measure the concentration of a target trace gas which has an ionization efficiency changed by the affect of impurities and which is absorbed on a pretreatment portion or piping, at a high accuracy and at real time, by adding an internal standard having a known concentration to the target trace gas.The concentration of the target trace gas is measured while an internal standard having substantially the same properties (such as ionization efficiency change and vapor pressure) as the target trace gas is added. The ion strengths of the target trace gas and the internal standard are compared to calibrate the concentration of the target trace gas.According to the present invention, the concentration of the target trace gas in gas containing impurities can be online measured at a real time and at high accuracy while being continuously calibrated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.