Patent · US Expired

Shallow depth, low pressure gas storage facilities and related methods of use

US6581618B2 · kind B2 · utility

21Cited by
2References
56Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 25, 2001
Grant dateJun 24, 2003
Priority date
Expiry dateMay 25, 2021

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T137/402
  • WIPO fieldIT methods for management
  • WIPO sectorElectrical engineering

Abstract

A shallow depth, low pressure gas storage facility(s) and related methods of use are disclosed for purposes relating to a supply of gas in a gas pipeline and a supply of gas to a user. The shallows depth, low pressure gas storage facility(s) of the present invention have characteristics of high deliverability of injection and withdrawal over a wide pressure range.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.