Surface modification of medical implants
US6582470B1 · kind B1 · utility
76Cited by
26References
25Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 22, 1997 |
| Grant date | Jun 24, 2003 |
| Priority date | — |
| Expiry date | Jan 22, 2017 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61F2310/00796
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A method of obtaining a porous titanium surface suitable for medical implants is provided. The titanium surface is exposed to a plasma comprising a reactive plasma gas, the reactive plasma gas comprising an active etching species and a sputtering gas. The plasma conditions are effective to modify the titanium surface and provide surface porosity. The plasma conditions are effective to non-uniformly etch and sputter the titanium surface.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.