Patent · US Expired

Method of manufacturing photo-alignment layer

US6582776B2 · kind B2 · utility

7Cited by
4References
7Claims
0Family size

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Key dates

Filing dateNov 19, 2001
Grant dateJun 24, 2003
Priority date
Expiry dateNov 19, 2021

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC09K2323/02
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A photo-alignment layer having excellent long-term stability to light and heat is manufactured by coating a material for the photo-alignment layer, which contains a dichroic dye having two or more polymerizable groups per molecule, on a substrate, and exposing the coating layer to polarized light, thereby imparting a photo-alignment function, and polymerizing the polymerizable groups by heating or light exposure.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.