Patent · US Expired

Process for making MVTR resin

US6583241B1 · kind B1 · utility

19Cited by
2References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 15, 2001
Grant dateJun 24, 2003
Priority date
Expiry dateMar 15, 2021

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S526/943
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

The present invention is directed to producing a resin which, when formed into a film, has excellent gas barrier and/or moisture barrier (low MVTR) properties. Further, the resin has a relatively high molecular weight distribution, preferably above 6, and has excellent processability/extrudability. The resin is produced using a cyclopentadienyl chromium compound, preferably a mono CpCr compound, on a support, preferably a silica support. A particularly preferred catalyst for use in the present invention comprises pentamethylcyclopentadienyidimethylchromiumpyridine. Preferably, the catalyst is used in a slurry polymerization process.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.