Patent · US Expired

Method of manufacturing a microstructure

US6583920B2 · kind B2 · utility

3Cited by
7References
24Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 29, 2001
Grant dateJun 24, 2003
Priority date
Expiry dateNov 29, 2021

Classification

  • Technology area (CPC B)Performing Operations; Transporting
  • CPC primaryB81C2201/0108
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

A method of manufacturing a micromirror actuator includes forming a trench on a substrate by etching, laminating a film-type organic layer on the substrate to cover but not fill the trench so that the trench is maintained hollow, and depositing and patterning a metal layer on the film-type organic layer and removing the film-type organic layer. According to the method of manufacturing a micromirror actuator, a micromirror can be easily planarized by laminating the film-type organic layer on the substrate including the trench, which reduces the cost of manufacturing the micromirror actuator and increases a reflectivity of the micromirror actuator by increasing the flatness level of the micromirror so as to enhance an optical transmission efficiency.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.