Method of manufacturing oxide thin film for bolometer
US6585909B2 · kind B2 · utility
4Cited by
2References
26Claims
0Family size
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Key dates
| Filing date | Oct 31, 2001 |
| Grant date | Jul 1, 2003 |
| Priority date | — |
| Expiry date | Jan 1, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01K17/003
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An oxide for use in a bolometer with an oxide thin-film formed is manufactured on an insulating substrate. Metal organic compound is dissolved in solvent to form solution during manufacturing the oxide thin-film. The solution is applied on the insulating substrate, and the applied solution is dried. A bond between carbon and oxygen is cut and decomposed by irradiating a laser ray with wavelength of 400 nm or less. A generated oxide is crystallized.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.