Method for producing silicon nanoparticles
US6585947B1 · kind B1 · utility
52Cited by
13References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 22, 1999 |
| Grant date | Jul 1, 2003 |
| Priority date | — |
| Expiry date | Oct 22, 2019 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S5/3031
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for producing the silicon nanoparticle of the invention is a gradual advancing electrochemical etch of bulk silicon. Separation of nanoparticles from the surface of the silicon may also be conducted. Once separated, various methods may be employed to form nanoparticles into colloids, crystals, films and other desirable forms. The particles may also be coated or doped.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.