Wafer level package and method for manufacturing the same
US6586275B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 20, 2002 |
| Grant date | Jul 1, 2003 |
| Priority date | — |
| Expiry date | Mar 20, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/3436
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A thermal-stress-absorbing interface structure between a semiconductor integrated circuit chip and a surface-mount structure and a method for manufacturing the same. The thermal-stress-absorbing interface structure comprises an elongated conductive-bump pad having a first length-wise end and a second length-wise end, and a side. The thermal-stress-absorbing interface structure includes means for allowing the first end of the pad to move up when the second end of the pad moves down and alternately allowing the first end to move down when the second end moves up, upon thermal cycling. The means has a center axis and the up-and-down movements of the pad are balanced on the center axis.In accordance with this novel structure of the present invention, interconnection reliability such as solder joint reliability can be significantly improved.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.