Low surface tension (meth) acrylate containing block copolymer prepared by controlled radical polymerization
US6586530B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 27, 2001 |
| Grant date | Jul 1, 2003 |
| Priority date | — |
| Expiry date | Sep 27, 2021 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F2438/01
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A block copolymer including a block of residues of a low surface tension (meth)acrylate monomer; a block of residues of a monomer free of hydroxyl group and amine group residues; and, optionally, a third block of residues of a monomer free of hydroxyl groups and amine groups. The first, second and third blocks are made of different residues from each other and the block copolymer has a polydispersity index of less than 2.5. A controlled radical polymerization method is disclosed to make the low surface tension block copolymers. The method includes the steps of sequentially adding a first monomer composition that is free of hydroxyl groups and amine groups and a second monomer composition that includes the low surface tension monomer to a suitable atom transfer radical polymerization initiator and polymerizing the monomer compositions to form a block copolymer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.